Summary

Technology Trends and Future Prospects of High-k Gate Dielectrics

Heiji WATANABE Takuji HOSOI 

Vol.95 No.11 pp.960-964

Publication Date:2012/11/01

Online ISSN:2188-2355

Print ISSN:0913-5693

Type of Manuscript:Special Issue : Cutting-edge Device Technologies in Globally Competitive Fields

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Online ISSN:2188-2355