Summary

Multigate FinFET Device Technology for 22-nm Node and Beyond

Meishoku MASAHARA 

Vol.95 No.11 pp.965-968

Publication Date:2012/11/01

Online ISSN:2188-2355

Print ISSN:0913-5693

Type of Manuscript:Special Issue : Cutting-edge Device Technologies in Globally Competitive Fields

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Online ISSN:2188-2355